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전체 선택해제
총 223건 검색
본문검색 결과만 보기
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The Fabrication of an Applicative Device for Trench Width and Depth Using Inductively Coupled Plasma and the Bulk Silicon Etching Process
Woo. Jong-Chang, Choi. Chang-Auck, Kim. Chang-Il 한국전기전자재료학회 Transactions on electrical and electronic materials 6 Pages
한국전기전자재료학회 Transactions on electrical and electronic materials 2014, Vol.15 No.1 49-54 (6 pages)
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The Dry Etching of TiN Thin Films Using Inductively Coupled CF4/Ar Plasma
Woo. Jong-Chang, Choi. Chang-Auck, Joo. Young-Hee, Kim. Han-Soo, Kim. Chang-Il 한국전기전자재료학회 Transactions on electrical and electronic materials 4 Pages
한국전기전자재료학회 Transactions on electrical and electronic materials 2013, Vol.14 No.2 67-70 (4 pages)
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The Use of Inductively Coupled CF4/Ar Plasma to Improve the Etch Rate of ZrO2 Thin Films
Kim. Han-Soo, Woo. Jong-Chang, Joo. Young-Hee, Kim. Chang-Il 한국전기전자재료학회 Transactions on electrical and electronic materials 4 Pages
한국전기전자재료학회 Transactions on electrical and electronic materials 2013, Vol.14 No.1 12-15 (4 pages)
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Dry Etching Properties of TiO2 Thin Film Using Inductively Coupled Plasma for Resistive Random Access Memory Application
Joo. Young-Hee, Woo. Jong-Chang, Kim. Chang-Il 한국전기전자재료학회 Transactions on electrical and electronic materials 5 Pages
한국전기전자재료학회 Transactions on electrical and electronic materials 2012, Vol.13 No.3 144-148 (5 pages)
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Dry Etching Characteristics of ZnO Thin Films for the Optoelectronic Device by Using Inductively Coupled Plasma
Joo. Young-Hee, Woo. Jong-Chang, Kim. Chang-Il 한국전기전자재료학회 Transactions on electrical and electronic materials 4 Pages
한국전기전자재료학회 Transactions on electrical and electronic materials 2012, Vol.13 No.1 6-9 (4 pages)
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The Dry Etching Properties on TiN Thin Film Using an N2/BCl3/Ar Inductively Coupled Plasma
Woo. Jong-Chang, Joo. Young-Hee, Park. Jung-Soo, Kim. Chang-Il 한국전기전자재료학회 Transactions on electrical and electronic materials 4 Pages
한국전기전자재료학회 Transactions on electrical and electronic materials 2011, Vol.12 No.4 144-147 (4 pages)
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Etching Characteristics of HfAlO3 Thin Films Using an Cl2/BCl3/Ar Inductively Coupled Plasma
Ha. Tae-Kyung, Woo. Jong-Chang, Kim. Chang-Il 한국전기전자재료학회 Transactions on electrical and electronic materials 4 Pages
한국전기전자재료학회 Transactions on electrical and electronic materials 2010, Vol.11 No.4 166-169 (4 pages)
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Dry Etching of Al2O3 Thin Films in O2/BCl3/Ar Inductively Coupled Plasma
Yang. Xeng, Woo. Jong-Chang, Um. Doo-Seung, Kim. Chang-Il 한국전기전자재료학회 Transactions on electrical and electronic materials 4 Pages
한국전기전자재료학회 Transactions on electrical and electronic materials 2010, Vol.11 No.5 202-205 (4 pages)
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Analysis of Novel Helmholtz-inductively Coupled Plasma Source and Its Application for Nano-Scale MOSFETs
Park. Kun-Joo, Kim. Kee-Hyun, Lee. Weon-Mook, Chae. Hee-Yeop, Han. In-Shik, Lee. Hi-Deok 한국전기전자재료학회 Transactions on electrical and electronic materials 5 Pages
한국전기전자재료학회 Transactions on electrical and electronic materials 2009, Vol.10 No.2 35-39 (5 pages)