설파민산 니켈 용액으로 40~60$^{circ}C$ 온도와 5~25 A/$dm^2$의 전류밀도 범위에서 1mm 두께까지 니켈을 전착시켰다. 1.2V 이상의 음극 과전압 크기에서 핵발생 속도의 증가에 따라 미세한 결정립 크기의 무질서 방위가 나타났고 0.63V에서 미세한 (110) 우선 방위가 나타났으며 그 사이의 크기에서는 강한(100) 우선방위가 형성되었다. (100) 우선방위는 조대한 주상정 조직을 나타냈고, 그 주상정의 폭은 전류밀도가 증가하면 감소하였다. X-ray응력 측정장치로 측정한 전착증 표면의 잔류응력 크기는 대부분 인장응력으로써 80MPa 이내였고 가끔 매우 작은 압축응력도 나타났다. 음극의 전류효율은 90% 이상이었으나 양극의 효율은 전류밀도, 온도, 특히 염화니켈의 양에 따라 50~90%의 효율을 나타냈다.
About 1 mm thick nickel electrodeposits were obtained from nickel sulphamate baths at 40 to 60$^{circ}C$ over the range of current densities form 5 to 25 A/$dm^2$. Deposits from above about 1.2V of cathode overpotential had randomly distributed fine grains due to a higher nucleation rate and hence had a high hardness. A deposit obtained at 0.63 V had the [110] orientation with a field oriented fine structure which yield a relatively high hardness. Deposite obtained at the intermediate overpotentials showed the [100] orientation with coarse field oriented structure whose column width tended to decrease with increasing cathode overpotential, which, in turn, gave rise to an increase in hardness. Residual stresses of the deposits measured by X-ray technique were mostly tensile but did not exceed 80 MPa, and were occasionally very small compressive. The cathode current efficiency was above 90% in all the electrolysis conditions, whereas the anode current efficiency varied from 50 to 90% with current density, bath temperature and nickel chloride concentration, among which the chloride was the most influential.
