- PECVD a-$SiN_x$:H 박막(薄膜)의 특성(特性)과 열적안정성(熱的安定性)
- ㆍ 저자명
- 송진수,박주석,Song. Jin-Soo,Park. Joo-Suk
- ㆍ 간행물명
- 태양에너지
- ㆍ 권/호정보
- 1986년|6권 1호|pp.12-23 (12 pages)
- ㆍ 발행정보
- 한국태양에너지학회
- ㆍ 파일정보
- 정기간행물| PDF텍스트
- ㆍ 주제분야
- 기타
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The PECVD $SiN_x:H$ films were made from the $SiH_4-N_2$ gas mixtures under such deposition conditions as 0.01 to 1.0 of $SiH_4/N_2$ volume ratio, 0.1 to $0.8W/cm^2$ of RF power, and 100 to $400^{circ}C$ of substrate temperature. The deposition rate, refractive index, hydrogen concentration, N/Si composition, optical gap and electric conductivity were measured, and the thermal stability and the optimum deposition conditions were investigated for the application of these films to the solar cell materials.