Recently, the photopolymer made of novolak resin as the base and the naphthoquinonediazide(NQD) as the photoreactive compound is used for the presensitized plate(PS plate). The reaction mechanism of the NQD-novolak resin on light exposure is considered. Upon exposure it undergoes a Wolff rearrangement, via ketene intermediate which react with water ti form an 3-indene carboxylic acid. It was also found that NQD type resin in this experiment shows a high relative sensitivity compared with imported sample from Japan.