- SOI MOSFET의 단채널 효과를 고려한 문턱전압과 I-V특성 연구
- ㆍ 저자명
- 김현철,나준호,김철성
- ㆍ 간행물명
- 電子工學會論文誌. Jounnal of the Korea institute of telematics and electronics. A. A
- ㆍ 권/호정보
- 1994년|8호|pp.34-45 (12 pages)
- ㆍ 발행정보
- 대한전자공학회
- ㆍ 파일정보
- 정기간행물| PDF텍스트
- ㆍ 주제분야
- 기타
We studied threshold voltages and I-V characteristics. considering short channel effect of the fully depleted thin film n-channel SOI MOSFET. We presented a charge sharing model when the back surface of short channel shows accumulation depletion and inversion state respectively. A degree of charge sharing can be compared according to each of back-surface conditions. Mobility is not assumed as constant and besides bulk mobility both the mobility defined by acoustic phonon scattering and the mobility by surface roughness scattering are taken into consideration. I-V characteristics is then implemented by the mobility including vertical and parallel electric field. kThe validity of the model is proved with the 2-dimensional device simulation (MEDICI) and experimental results. The threshold voltage and charge sharing region controlled by source or drain reduced with increasing back gate voltage. The mobility is dependent upon scattering effect and electric field. so it has a strong influence on I-V characteristics.