Photoelastic experiment has been restricted by three significant problems such as the problems of modeling for a complicated body, of development of experimental model material, and of residual stress in photoelastic specimen. The residual stress in photoelastic model materials is caused by molding, cutting and time effects, etc.. Especially, large residual stress exists on the interface of photoelastic model material for bi-material. Small residual stress occurred in the photoelastic model materials is usually neglected in the photoelastic experiments. But the residual stress provides some errors in the results of photoelastic experiments. In this paper, the stress optic law which can be effectively applied to the phtoelastic model materials with residual stress is developed. By using this stress optic law, we can obtain good results from isochromatic fringe patterns of photoelastic experiment specimen in which residual stress are involved. The stress optic law can be applied to obtain good results of photoelastic experiment from composite materials or bimaterials.