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서지반출
Fabrication of Diamond Films for Electronic Devices
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  • Fabrication of Diamond Films for Electronic Devices
  • Fabrication of Diamond Films for Electronic Devices
저자명
Hiraki. Akio
간행물명
Fabrication and Characterization of Advanced Materials
권/호정보
1995년|2권 |pp.1065-1068 (4 pages)
발행정보
한국재료학회
파일정보
정기간행물|ENG|
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기타
이 논문은 한국과학기술정보연구원과 논문 연계를 통해 무료로 제공되는 원문입니다.
서지반출

기타언어초록

Our group has developed diamond film synthesis in vapor phase by the so-called magneto-active microwave plasma chemical vapor deposition. The goal of the diamond film growth over large area at belwo $200^{circ}C$ with high quality has been tried rather successfully. The growth rate can be enhanced by pulse modulated discrage which enables us to control radical densities in the plasma. Thermal flux to the substrate from the palsma can be reduced with decreaing the duty ratio of the discharger resulting in cooling down the substrated for the low temperature deposition. Nanocrystal seeding is Essentially and unique pretreatment for diamond nuclei to improve the film quality. Such high-density and high-quality nuclei due to the seeding with purified nanocrystalline diamond paricles can be realized netither through scratcihing norbiasing at low temperature, e.g., below $200^{circ}C$ .