In the present paper, a new type of DC arc plasma torch is disclosed. The principles of the new magnetic and fluid dynamic controlled large orifice long discharge tunnel plasma torch is discussed. Two series of DC Plasma Jet diamond film deposition equipment have been developed. The 20kW Jet equipped with a $Phi$70 mm orifice torch is capable of deposition diamond films at a growth rate as high as 40$mu extrm{m}$/h over a substrate area of $Phi$65 mm. The 100kW high power Jet which is newly developed based on the experience of the low power model is equipped with a $Phi$120 mm orifice torch, and is capable of depositing diamond films over a substrate area of $Phi$110 mm at growth rate as high as 40 $mu extrm{m}$/h, and can be operated at gas recycling mode, which allows 95% of the gases be recycled. It is demonstrated that the new type DC plasma torch can be easily scaled up to even higher power Jet. It is estimated that even by the 100kW Jet, the cost for tool grade diamond films can be as low as less than ＄4/carat.