NdFeB films have been grown onto Si(100) substrate by a KrF pulsed laser ablation of the targets of $Nd_xFe_{90.98-x}B_{9.02}$ (x=17.51~27.51) at the substrate temperature of 620~700 $^{circ}C$ and the laser beam energy density of 2.75~5.99 J/$ extrm{cm}^2$. The films exhibit no preferred orientation, however, good hard magnetic properties were produced from as-deposited condition : $4{pi}M_s$=7 kG, $4{pi}M_r$=4 kG, and $H_c$=300~1000 Oe. The depositon rate was not greatly influenced by changing the substrate temperature, but it increases linearly by increasing the beam energy density. The beam energy density of 3 J/$ extrm{cm}^2$ gave the optimal condition to have the highest $4{pi}M_r$ and $H_c$ as well. The higher content of Nd induces a higher coercivity and $4{pi}M_r$ at the same time without prominent change in $4{pi}M_s$.