플라즈마 화학기상증착법에 의해 증착된 저유전율 SiOF박막의 물성 안정화를 위하여 증착후 $N_2O$플라즈마로 열처리함으로써 그 특성을 평가하였다. SiOF박막은 대기방치 및 열처리에 불안정한 성질을 가진다. SiOF 박막은 박막내의 F-Si-F 결합의 존재 때문에 흡습현상이 발생하며, 박막내의 F함량이 증가함에 따라 수분 흡수가 증가한다. 또한 열처리를 거치면서 F이 탈착되어 박막내의 F함량이 감소한다. $N_2O$플라즈마 열처리는 표면에 얇은 SiON층을 형성시킴으로써 박막을 안정화시키는데 효과적이었다. 그러나 장시간의 N/sun 2/O플라즈마 열처리는 유전율을 크게 증가시킨다. 따라서 $N_2O$플라즈마 열처리에 의한 유전율의 증가없이 물성을 안정화 시키기 위해서는, 대기방치나 열처리에 의한 안정화 효과를 유지하면서 $N_2O$플라즈마 열처리에 의한 유전율의 증가를 최소화시킬 수 있는 공정의 확립이 필요하다.
The stabilization of low dielectric constant SiOF films prepared by conventional PECVD using TEOS and $C_2F_6$ was evaluated by the $N_2O$-plasma post-deposition annealing. Properties of SiOF film became unstable when it was air-exposed or heat-treated. Water absorption of SiOF films was increased as F content was increased due to the for¬mation of F -Si- F bonds. Also F content of SiOF films decreased after heat treatment. $N_2O$-plasma post-deposition annealing was proved to be effective on stabilizing SiOF films. which was mainly due to the formation of thin SiON layer near the top surface of films. However. the value of dielectric constant was greatly increased again when $N_2O$-plasma post-deposition annealing was done for a long time. To stabilize the SiOF films without an increase of dielec¬tric constant by $N_2O$- plasma post-deposition annealing. the annealing time should be kept the minimum value. to which stabilizing effects against air environment and heat treatment were preserved.
