This paper will present an anisotropic etching in TMAH technique used in the fabrication of three-dimensional magnetic field vector sensor based on angled Hall plate structure. This sensor design relies on simultaneously detecting all magnetic field vector components using Hall plates that are imbedded into the silicon [111] sloped-surface of bulk micromachined cavity by the anisotropic etching of [100] silicon. The fabricated Hall elements has relatively improved sensitivity compare to convensional Hall elements for three-dimensional magnetic field sensing. The product sensitivity of 547V/AT at the supply current of 1.0mA was achived. The corresponding limit in the detection of magnrtic field is 0.07G that calculated by measured power spectral density(PSD) in magnetic sensor output.