This paper describes the design of the monitoring system for monitoring the current status and indirect controlling of the Wet Station Equipment which is used for cleaning the wafer. Most of the conventional monitoring system depend on the special hardware and software. Basic design goal of monitoring system is provide the convenience for the use and the portability for the system. In order for the system to fulfil its requirements, it was designed using GUI (Graphical User Interface) facility based on the windows NT environment of IBM PC compatible and EtherNet board based on the TCP/IP protocol