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PREPARATION OF HYDROXYAPATITE COATINGS USING R.F. MAGNETRON SPUTTERING
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  • PREPARATION OF HYDROXYAPATITE COATINGS USING R.F. MAGNETRON SPUTTERING
  • PREPARATION OF HYDROXYAPATITE COATINGS USING R.F. MAGNETRON SPUTTERING
저자명
Hosoya. Satoru,Sakamoto. Yukihiro,Hashimoto. Kazuaki,Takaya. Matsufumi,Toda. Yoshitomo
간행물명
한국표면공학회지
권/호정보
1999년|32권 3호|pp.307-311 (5 pages)
발행정보
한국표면공학회
파일정보
정기간행물|ENG|
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기타
이 논문은 한국과학기술정보연구원과 논문 연계를 통해 무료로 제공되는 원문입니다.
서지반출

기타언어초록

The well-crystalline hydroxyapatite($Ca_{10}(PO_4)_6(OH)_2$ ; HAp) layer having a biocompatibility was successfully coated onto titanium substrate using a radio-frequency magnetron sputtering, and effects of sputtering gas and the thickness of HAp film on a crystal growth of the HAp layers were investigated. The deposition rate of the layer sputtered with water-vapour gas was slower than that of the layer sputtered with argon gas. The results of X-ray diffraction demonstrated that the about $0.8mu extrm{m}$ thick HAp film under water-vapour gas was an amorphous phase, the about $1.2mu extrm{m}$ thick film was (100) plane-oriented HAp, and the about $1.5mu extrm{m}$ thick film was (001)plane-oriented HAp. FT-IR analysis proved that hydroxyl group of the layer sputtered with argon gas was defected, but that of the layer sputtered with water-vapour gas was not defected. From these results, it was favorable to use water-vapour gas on the HAp coatings onto metal surface.