This paper presents comparative results of various commonly used anti-stiction methods for polysilicon surface micromachining using identical test structures. Four different types of cantilevers - single cantilevers, cantilevers with dimples, cantilevers with anti-stiction tip, cantilevers with plate - with different widths and lengths were employed as test structures. The detachment length of cantilevers was examined depending on the anti-stiction methods and test structure types. After sacrificial layer was removed, evaporation and sublimation drying methods were used in the drying step when takes place the stiction between structure and substrate. Various final rinsing liquids such as methanol, IPA, and DI water were employed to compare anti-stiction results depending on surface tension and rinsing temperature. For sublimation drying method, methanol was used as an intermediate rinsing liquid. Also, the influence of a stress gradient of the polysilicon was investigated by performing the identical anti-stiction experiments on identical test structures with a stress gradient. In conclusion, sublimation drying method showed superior results to various evaporation drying methods and hence it is considered the best method for releasing polysilicon microstructure in polysilicon surface micromachining.