Deposition condition of NiO that is one of Possible buffer layers for YBCO coated conductors was studied. NiO was deposited on textured Ni substrates by a MOCVD (metal-organic chemical vapor deposition) method. The degree of texture, and the surface roughness were analyzed by X-ray Pole figure, atomic force microscope and scanning electron microscope. The (111) and (200) textures were competitively developed , depending on an oxygen partial Pressure(PO2) and deposition temperature (Tp). The (200) textured NiO layer was deposited at Tp=450~47$0^{circ}C$ and PO2= 1.67 Torr Out-of-Plane ($omega$-scan) and in-plane ($Phi$-scan) textures of the (200) NiO films were as good as 10.34$^{circ}$ and 10.00$^{circ}$ respectively The AFM surface roughness of NiO was in the range of 3~4.5 nm at PO2=0.91~3.34 Torr and at Tp=47$0^{circ}C$ , and in the range of 3~13 nm at TP=450~53$0^{circ}C$ and at PO2=1.67 Torr.