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Excitation Wavelength Dependence of Laser Ablation Mechanism of Urethane-Urea Copolymer Film Studied by Time-Resolved Absorbance Measurements
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  • Excitation Wavelength Dependence of Laser Ablation Mechanism of Urethane-Urea Copolymer Film Studied by Time-Resolved Absorbance Measurements
  • Excitation Wavelength Dependence of Laser Ablation Mechanism of Urethane-Urea Copolymer Film Studied by Time-Resolved Absorbance Measurements
저자명
Tada. Takuji,Asahi. Tsuyoshi,Masuhara. Hiroshi,Tsuchimori. Masaaki,Watanabe. Osamu
간행물명
Journal of photoscience: an international journal officail organ of the Korean Society of Photoscience
권/호정보
2003년|10권 1호|pp.97-104 (8 pages)
발행정보
한국광과학회
파일정보
정기간행물|ENG|
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이 논문은 한국과학기술정보연구원과 논문 연계를 통해 무료로 제공되는 원문입니다.
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기타언어초록

The excitation wavelength dependence of laser ablation dynamics of an azobenzene-containing urethane-urea copolymer film was investigated by measuring the laser fluence dependence of etch depth, transient absorbance change at each excitation wavelength, and transient absorption spectra. Moreover expansion/contraction dynamics was studied by applying nanosecond time-resolved interferometry. The threshold was determined at several excitation wavelengths from etch depth measurement, while time-integrated absorbance was obtained under excitation conditions. The photon energy required to remove the topmost of surface layer of the film did not .depend on excitation wavelength, and the penetration depth of excitation pulse dominated the etch depth. When the excitation wavelength was longer than 500 nm, permanent swelling was clearly observed but not for shorter wavelength excitation. In the latter case, photoisomerization occurred during excitation and the following photoreduction may play an important role. On the basis of the observations made in this study, a photochemical and photothermal mechanisms can explain mostly the short and long wavelength excitation results, respectively.