- 유리의 미세 가공을 위한 구리 전극군의 제작과 전기 화학 방전 가공 시험
- ㆍ 저자명
- 정주명,심우영,정옥찬,양상식
- ㆍ 간행물명
- 전기학회논문지. The transactions of the Korean Institute of Electrical Engineers. C/ C, 전기물성·응용부문
- ㆍ 권/호정보
- 2004년|53권 9호|pp.488-493 (6 pages)
- ㆍ 발행정보
- 대한전기학회
- ㆍ 파일정보
- 정기간행물| PDF텍스트
- ㆍ 주제분야
- 기타
In this paper, we present the fabrication of copper electrode array and test of electrochemical discharge machining(ECDM) for glass machining. An array of 72 Cu electrodes is used to machine Borofloat33 glass. The height and diameter of a Cu electrode are 400 $mu extrm{m}$ and 100 $mu extrm{m}$ respectively. It is fabricated by ICP-RIE, Au-Au thermo-compression bonding, and copper electroplating. Borofloat33 glass is machined by the fabricated copper electrode array in 60 seconds at 55 V. The surface roughness of the machined glass is measured and the machined glass is anodically bonded with silicon.