- CMOS 공정을 이용한 2차원 SSIMT의 특성
- ㆍ 저자명
- 송윤귀,류지구,Song. Youn-Gui,Ryu. Ji-Goo
- ㆍ 간행물명
- 전기전자재료학회논문지
- ㆍ 권/호정보
- 2007년|20권 8호|pp.697-700 (4 pages)
- ㆍ 발행정보
- 한국전기전자재료학회
- ㆍ 파일정보
- 정기간행물| PDF텍스트
- ㆍ 주제분야
- 기타
A novel 2-Dimensional Suppressed Sidewall Injection Magnetotransistor (SSIMT) with high linearity has been fabricated on the standard CMOS technology and experimentally verified. The novel 2-Dimensional SSIMT overcomes the restriction of the standard CMOS technology. Experimental results of the fabricated 2-Dimensional SSIMT show that the variation of each collector output currents are extremely linear as a function of magnetic field from -200mT to 200mT at $I_B = 1 mA,;V_{CE} = 5 V;and;V_{SE} = 5 V$. The relative sensitivity shows up to 13 %/T. The measured nonlinearity of the fabricated device is about 0.9%.