- 이온 플레이팅용 장수명 플라즈마 건 장치의 개발
- ㆍ 저자명
- 최영욱,Choi. Young-Wook
- ㆍ 간행물명
- 전기학회논문지= The Transactions of the Korean Institute of Electrical Engineers
- ㆍ 권/호정보
- 2008년|57권 1호|pp.78-81 (4 pages)
- ㆍ 발행정보
- 대한전기학회
- ㆍ 파일정보
- 정기간행물| PDF텍스트
- ㆍ 주제분야
- 기타
A hollow cathode which has extremely stable discharge characteristic has been developed. This is composed of the two separated lanthanum hexaboride(LaB6) of a disk type in the tube as the electron emitters. The way of design is of great advantage to extend the surface discharge area of the LaB6, which is also useful for optimal fixing of the LaB6. The hollow cathode is capable of producing 30 kW(100 V, 300 A) of power continuously. Because the generated plasma beam with the high temperature(above $3000^{circ}C$) from the hollow cathode passes through the center hole of the two intermediate electrodes, it is designed with the high temperature material of the tungsten and the suitable structure of the water cooling. The combinations of the hollow cathode and the two intermediate electrodes are practically useful for the ion plating plasma beam source.