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Effect of the Hydrophobicity of Hybrid Gate Dielectrics on a ZnO Thin Film Transistor
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  • Effect of the Hydrophobicity of Hybrid Gate Dielectrics on a ZnO Thin Film Transistor
  • Effect of the Hydrophobicity of Hybrid Gate Dielectrics on a ZnO Thin Film Transistor
저자명
Choi. Woon-Seop,Kim. Se-Hyun
간행물명
Transactions on electrical and electronic materials
권/호정보
2010년|11권 6호|pp.257-260 (4 pages)
발행정보
한국전기전자재료학회
파일정보
정기간행물|ENG|
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이 논문은 한국과학기술정보연구원과 논문 연계를 통해 무료로 제공되는 원문입니다.
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기타언어초록

Zinc oxide (ZnO) bottom-contact thin-film transistors (TFTs) were prepared by the use of injector type atomic layer deposition. Two hybrid gate oxide systems of different polarity polymers with silicon oxide were examined with the aim of improving the properties of the transistors. The mobility and threshold voltage of a ZnO TFT with a poly(4-dimethylsilyl styrene) (Si-PS)/silicon oxide hybrid gate dielectric had values of 0.41 $cm^2/Vs$ and 24.4 V, and for polyimide/silicon oxide these values were 0.41 $cm^2/Vs$ and 24.4 V, respectively. The good hysteresis property was obtained with the dielectric of hydrophobicity. The solid output saturation behavior of ZnO TFTs was demonstrated with a $10^6$ on-off ratio.