- Silver-Tantalate-Niobate Thick Film의 유전 특성 연구
- ㆍ 저자명
- 이규탁,윤석우,강이구,고중혁,Lee. Ku-Tak,Yun. Seok-Woo,Kang. Ey-Goo,Koh. Jung-Hyuk
- ㆍ 간행물명
- 전기전자재료학회논문지
- ㆍ 권/호정보
- 2010년|23권 7호|pp.521-524 (4 pages)
- ㆍ 발행정보
- 한국전기전자재료학회
- ㆍ 파일정보
- 정기간행물| PDF텍스트
- ㆍ 주제분야
- 기타
Low loss perovskite niobates and tantalates have been placed on a short list of functional materials for future technologies. In this study, we fabricated Ag(Ta,Nb)$O_3$ thick films on the $Al_2O_3$ substrates by the screen printing method. The Ag(Ta,Nb)$O_3$ powders were fabricated by the mixed oxide method. The sintering temperature and time were $1150^{circ}C$ and 2 hrs, respectively. The results of XRD analysis showed that the specimens employed in this study had the pesudo cubic structure. The dielectric permittivity and loss tangent of the films have been characterized from 1 kHz to 1 MHz. Also the dielectric permittivity and loss tangent were measured from 303 K to 393 K. The electrical properties of the film are also discussed.