This paper analyzes optimal stirrer parameter to improve field uniformity in a mode-stirred reverberation chamber. Stirrer parameter is varied about stirrer height and stirrer angle. Also we analyze quality factor, number of excited modes and stirrer efficiency that affect field uniformity. The results show good performance as higher as stirrer height. Isotropic field distribution is formed at $45^{circ}$ stirrer angle. When stirrer angle varies, scattering characteristic of incident wave are changed. So electric field distribution in a mode-stirred reverberation chamber is also changed. Therefore, it affect field uniformity. The results expect to help that designs stirrer for get better field uniformity. Immunity test performed designed mode-stirred reverberation chamber for semiconductor that categorized by technology. Test result shows that good recurrence compared wave-guide immunity test.