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Highly-Efficient Optical Gating in Vanadium Dioxide Junction Device
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  • Highly-Efficient Optical Gating in Vanadium Dioxide Junction Device
  • Highly-Efficient Optical Gating in Vanadium Dioxide Junction Device
저자명
Lee. Yong-Wook
간행물명
Journal of sensor science and technology
권/호정보
2011년|20권 4호|pp.230-233 (4 pages)
발행정보
한국센서학회
파일정보
정기간행물|ENG|
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이 논문은 한국과학기술정보연구원과 논문 연계를 통해 무료로 제공되는 원문입니다.
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기타언어초록

In this paper, highly-efficient optical gating in a junction device based on vanadium dioxide($VO_2$) thin film grown by a sol-gel method was investigated as a gate terminal of a three-terminal device using infrared light with a wavelength of ~1554.6 nm. Due to the photoinduced phase transition, the threshold voltage of the $VO_2$ junction device, at which the device current abruptly jumps, could be tuned with a sensitivity of ~96.5 V/W by adjusting the optical power of the infrared light directly illuminating the device. Compared with the tuning efficiency of the previous device fabricated using $VO_2$ thin film deposited by a pulsed laser deposition method, the threshold voltage of this device could be tuned by ~76.8 % at an illumination power of ~39.8 mW resulting in a tuning efficiency of ~1.930 %/mW, which is ~4.9 times larger than the previous device.