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A Methodology of Dual Gate MOSFET Dosimeter with Compensated Temperature Sensitivity
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  • A Methodology of Dual Gate MOSFET Dosimeter with Compensated Temperature Sensitivity
  • A Methodology of Dual Gate MOSFET Dosimeter with Compensated Temperature Sensitivity
저자명
Lho. Young-Hwan
간행물명
전기전자학회논문지
권/호정보
2011년|15권 2호|pp.143-148 (6 pages)
발행정보
한국전기전자학회
파일정보
정기간행물|ENG|
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이 논문은 한국과학기술정보연구원과 논문 연계를 통해 무료로 제공되는 원문입니다.
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기타언어초록

MOS (Metal-Oxide Semconductor) devices among the most sensistive of all semiconductors to radiation, in particular ionizing radiation, showing much change even after a relatively low dose. The necessity of a radiation dosimeter robust enough for the working environment has increased in the fields of aerospace, radio-therapy, atomic power plant facilities, and other places where radiation exists. The power MOSFET (Metal-Oxide Semiconductor Field-Effect Transistor) has been tested for use as a gamma radiation dosimeter by measuring the variation of threshold voltage based on the quantity of dose, and a maximum total dose of 30 krad exposed to a $^{60}Co$ ${gamma}$-radiation source, which is sensitive to environment parameters such as temperature. The gate oxide structures give the main influence on the changes in the electrical characteristics affected by irradiation. The variation of threshold voltage on the operating temperature has caused errors, and needs calibration. These effects can be overcome by adjusting gate oxide thickness and implanting impurity at the surface of well region in MOSFET.