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Nitrogen Incorporation of Nanostructured Amorphous Carbon Thin Films by Aerosol-Assisted Chemical Vapor Deposition
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  • Nitrogen Incorporation of Nanostructured Amorphous Carbon Thin Films by Aerosol-Assisted Chemical Vapor Deposition
  • Nitrogen Incorporation of Nanostructured Amorphous Carbon Thin Films by Aerosol-Assisted Chemical Vapor Deposition
저자명
Fadzilah. A.N.,Dayana. K.,Rusop. M.
간행물명
Transactions on electrical and electronic materials
권/호정보
2013년|14권 4호|pp.165-171 (7 pages)
발행정보
한국전기전자재료학회
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정기간행물|ENG|
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이 논문은 한국과학기술정보연구원과 논문 연계를 통해 무료로 제공되는 원문입니다.
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Nanostructured pure a-C and nitrogen doped a-C: N thin films with small particle size of, ~50 nm were obtained by Aerosol-assisted CVD method from the natural precursor camphor oil. Five samples were prepared for the a-C and a-C: N respectively, with the deposition temperatures ranging from $400^{circ}C$ to $600^{circ}C$. At high temperature, the AFM clarifies an even smoother image, due to the increase of the energetic carbon ion bombardment at the surface of the thin film. An ohmic contact was acquired from the current-voltage solar simulator characterization. The higher conductivity of a-C: N, of ${sim}{ imes}10^{-2}Scm^{-1}$ is due to the decrease in defects since the spin density gap decrease with the nitrogen addition. Pure a-C exhibit absorption coefficient, ${alpha}$ of $10^4cm^{-1}$, whereas for a-C:N, ${alpha}$ is of $10^5cm^{-1}$. The high ${sigma}$ value of a-C:N is due to the presence of more graphitic component ($sp^2$ carbon bonding) in the carbon films.