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Characteristics of NbN Films Deposited on AISI 304 Using Inductively Coupled Plasma Assisted DC Magnetron Sputtering Method
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  • Characteristics of NbN Films Deposited on AISI 304 Using Inductively Coupled Plasma Assisted DC Magnetron Sputtering Method
  • Characteristics of NbN Films Deposited on AISI 304 Using Inductively Coupled Plasma Assisted DC Magnetron Sputtering Method
저자명
Jun. Shinhee,Kim. Junho,Kim. Sunkwang,You. Yong Zoo,Cha. Byungchul
간행물명
한국표면공학회지
권/호정보
2013년|46권 5호|pp.187-191 (5 pages)
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한국표면공학회
파일정보
정기간행물|ENG|
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이 논문은 한국과학기술정보연구원과 논문 연계를 통해 무료로 제공되는 원문입니다.
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기타언어초록

Niobium nitride (NbN) films were deposited on AISI 304 stainless steels by inductively coupled plasma (ICP) assisted dc magnetron sputtering method at different ICP powers, and the effects of ICP power on the phase formation, mechanical and chemical properties of the films were investigated. X-ray diffraction analysis (XRD) and field emission scanning electron microscopy (FESEM) were used to analyze the crystal structure and micro-knoop hardness was used to measure the hardness of the films. Also, 3-D mechanical profiler and a ball-on-disk wear tester were used to measure the thickness of the films and to estimate wear characteristics, respectively. The thickness of the films decreased but their hardness increased with increasing ICP power, and it was confirmed that only cubic ${delta}$-NbN(200) remained at high ICP power. At lower ICP powers, a mixture of the hexagonal ${delta}^{prime}$-NbN and cubic ${delta}$-NbN phases was obtained in the films and the hardness decreased. The corrosion potential value increased gradually with increasing ICP power, but the changes of ICP power did not significantly influence the overall corrosion resistance.