Purpose: The aim of this study was to investigate the effect of implant thread profile on the marginal bone stresses which develop during implant insertion. Materials and methods: Four experimental implants were created by placing four different thread systems on the body ($4.1mm{ imes}10mm$) of the ITI standard implant. The thread types studied in this study included the buttress, v-shape, reverse buttress, and square shape threads. In order to examine the insertion stress generation, 3D dynamic finite element analysis was performed which simulated the insertion process of implants into a 1.2 mm thick cortical bone plate (containing 3.5 mm pilot hole) using a PC-based DEFORM 3D (ver 6.1, SFTC, Columbus, OH, USA) program. Results: Insertion stresses higher than human cortical bone developed around the implants. The level of insertion stresses was much different depending on the thread. Stress level was lowest near the v-shape thread, and highest near the square shaped thread. Difference in the interfacial bone stress level was more noticeable near the valley than the tip of the threads. Conclusion: Among the four threads, the v-shape thread was turned out to minimize the insertion stress level and thereby create better conditions for implant osseointegration.