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Fractal Analysis of the Surface in Thin Film Capacitors
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  • Fractal Analysis of the Surface in Thin Film Capacitors
  • Fractal Analysis of the Surface in Thin Film Capacitors
저자명
Hong. Kyung-Jin,Min. Yong-Ki,Cho. Jae-Cheol
간행물명
KIEE international transactions on electrophysics and applications
권/호정보
2001년|2호|pp.18-22 (5 pages)
발행정보
대한전기학회
파일정보
정기간행물|ENG|
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이 논문은 한국과학기술정보연구원과 논문 연계를 통해 무료로 제공되는 원문입니다.
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기타언어초록

The thin films of high permitivity in ferroelectric materials using a capacitor are applied to DRAMs and FRAMs. (Ba, Sr)TiO$_3$ thin as ferroelectric materials were prepared by the sol-gel method and made by spin-coating on the Pt/Sio$_2$/Si substrate at 4,000 [rpm] for 10 seconds. The structural characteristics of the surface were analyzed by fractal dimension. The thickness of BST ceramics thin films was about 260∼280 [nm]. The property of the leakage current was stable with 10-9∼10-11[A] when the applied voltage was 0∼3[V]. BST thin films ha low leakage current properties when fractal dimension was low and a coating area was high.