V-groove N+P solar cell is fabricated by thermal diffusion in silicon wafer with (100) crystal structure. To form the V-grooves in (100) silicon surface, a mixture of etylen-diamine, water, pyrocathecol is used as the etchant of anisotropic etching. Under light intensity of 100mW/$ extrm{cm}^2$, the efficiency of the V-groove solar cell is 2.5-3.5% greater than the conventional N+P solar cell and 0.4-0.6% greater than the texturized one.