A hot wall epitaxy (HWE) apparatus with double source tubes was manufactured. This apparatus can be used to grow two kinds of epilayers at the same time or to grow heterostructures and multilayers. Undoped ZnSe single crystal films were grown on GaAs(100) substrates byusing this apparatus. SEM, XRD and PL analyses indicated that epilayers had good crystalline and optical quality. The epilayers grown at the source temperature 660 .deg. C and the substrates temperature $350^{circ}C$. in $2 { imes} 10^{-6}$ toor were mirror like and good quality. PL measurements show that the crystalline qualityis comparable with that of the ZnSe/GaAs epilayer grown by molecular beam epitaxy.