- 내부확산법으로 제조한 $Nb_3$Sn선재의 미세조직 및 임계전류밀도특성
- ㆍ 저자명
- 김상철,오상수,하동우,하홍수,류강식,권해웅
- ㆍ 간행물명
- 전기전자재료학회논문지
- ㆍ 권/호정보
- 1998년|11권 11호|pp.1022-1026 (5 pages)
- ㆍ 발행정보
- 한국전기전자재료학회
- ㆍ 파일정보
- 정기간행물| PDF텍스트
- ㆍ 주제분야
- 기타
The mutifilamentary $Nb_3$Sn wire containing 135 Nb filaments was manufactured by the internal tin method. The critical current density ($J_C$) in magnetic fields for the wires heat-treated at $660^{/circ}C$ and $700^{/circ}C$ were investigated. The Non-Cu $J_C$ and n-value of 0.82 mm$phi$ $Nb_3$Sn wire heat-treated at $700^{/circ}C$ for 240 hours was approximately 450 A/$mm^2$ at 12T, 4.2K and 14, respectively. Also the $B_{C2}$ of $Nb_3$Sn wire extrapolated by Kramer plot was 27.2T. The wire heat-treated at $700^{/circ}C$ for 240 hours showed smaller residual tin concentration in the matrix and the larger area of $Nb_3$Sn layer as comparison with the wire heat-treated at $660^{/circ}C$.