- 전기화학적 에칭을 이용한 텅스텐 미세 탐침 가공
- ㆍ 저자명
- 인치현,김규만,주종남,In. Chi-Hyun,Kim. Gyu-Man,Chu. Chong-Nam
- ㆍ 간행물명
- 한국정밀공학회지
- ㆍ 권/호정보
- 2001년|18권 2호|pp.111-118 (8 pages)
- ㆍ 발행정보
- 한국정밀공학회
- ㆍ 파일정보
- 정기간행물| PDF텍스트
- ㆍ 주제분야
- 기타
Tungsten probe is the most important part of a probe card, which is widely used for the performance test of wafer chips. Electro chemical etching becomes an exclusive choice for mass production of the tungsten probes. In the mass production, not only the shape of the probe but also the shape distribution of machined probes is important. A new method is proposed for the mass production of the tungsten probes. Tungsten wires are separated by a distance, and dipped into electrolyte. The dipping rate is controlled to shape the probes. Several experimental tests are performed to study the machining characteristics. From the test results, machining parameters including electrical conditions and anode position showed significant influences on the shape, repeatability, precision and quality of sharp tips.