- 고전압 방전 플라즈마에 의해 합성한 질화탄소 박막의 열처리 효과
- ㆍ 저자명
- 김종일
- ㆍ 간행물명
- 전기전자재료학회논문지
- ㆍ 권/호정보
- 2002년|15권 5호|pp.455-459 (5 pages)
- ㆍ 발행정보
- 한국전기전자재료학회
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- 정기간행물| PDF텍스트
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- 기타
I have investigated the effects of annealing on a polymeric $alpha-C_3N_{4.2}$ at high pressure and temperature in the presence of seeds of crystalline carbon nitride films prepared by a high voltage discharge plasma. The samples were evaluated by x-ray photoelectron spectroscopy (XPS), infrared spectroscopy, Auger electron spectroscopy and x-ray diffraction(XRD). Notably, XPS studies of the film composition before and after annealing demonstrate that the nitrogen composition in $alpha-C_3N_{4.2}$ material initially containing more than 58% nitrogen decreases during the annealing process and reaches a common, stable composition of ~43%. XPS analysis also shows that the nitrogen composition in the annealed films without polymeric $alpha-C_3N_{4.2}$ was reduced from 35% to 17%. Furthermore the concentration of the sp$^3$bonded phase increased with the increment of the annealing temperature.