- Formation of Hydroxyl Radical from the Hydrogen Chemisorbed Silicon Surface by Incident Oxygen Atoms
- Formation of Hydroxyl Radical from the Hydrogen Chemisorbed Silicon Surface by Incident Oxygen Atoms
- ㆍ 저자명
- Ree. Jong-Baik,Chang. Kyung-Soon,Kim. Yoo-Hang,Shin. Hyung-Kyu
- ㆍ 간행물명
- Bulletin of the Korean Chemical Society
- ㆍ 권/호정보
- 2003년|24권 7호|pp.986-992 (7 pages)
- ㆍ 발행정보
- 대한화학회
- ㆍ 파일정보
- 정기간행물|ENG| PDF텍스트
- ㆍ 주제분야
- 기타
