This study investigated the effects of the substrate and powder content on the fabrication of SiO$_{2}$ photonic crystals by evaporation method. Photonic crystals were self-assembled on quartz, Corning 1737 glass, slide glass, and ITa glass to verify the effects of the wetting angle and surface morphology. The powder contents of the solution were varied from 0.2 to 2.0 wt$\%$. The number of photonic crystal layers increased according to the decrease of wetting angle and surface roughness. The resultant photonic crystals showed the best optical characteristics when the number of photonic crystal layers was within 40 and 50. In addition, the intensity peak of Fabry­Perot fringes increased when the wetting angle was large and the particle size was small. Photonic crystals coated on ITO glass showed the highest reflectance peak of 63$\%$ relative intensity.