MEMS and LIGA technologies have been used for fabricating microstructures, but their shape is not 3D because of difficulty for preparation of many masks. To fabricate 3D microstructures, microstereolithography technology based on Digital Micromirror Device($DMD^{TM}$) was introduced. It has no need of masks and is capable of fabricating high aspect ratio microstructures. In this technology, STL file is the standard format as the same of conventional rapid prototyping system, and 3D parts are fabricated by layer-by-layer according to 2D section sliced from STL file. The UV light source is illuminated to DMD which makes bitmap images of 2D section, and they are transferred and focused on resin surface. In this paper, we addressed optical design of microstereolithography system in consideration of light path according to DMD operation and image-forming on the resin surface using optical design program. To verify the performance of implemented microstereolithography system, 3D microstructures with complexity and high aspect ratio were fabricated.