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Surface Modification and Characterization of $N^+$ Ion Implantation on Polyimide Film
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  • Surface Modification and Characterization of $N^+$ Ion Implantation on Polyimide Film
  • Surface Modification and Characterization of $N^+$ Ion Implantation on Polyimide Film
저자명
Shin. Jin-Wook,Jeun. Joon-Pyo,Kang. Phil-Hyun
간행물명
Macromolecular research
권/호정보
2010년|18권 3호|pp.227-232 (6 pages)
발행정보
한국고분자학회
파일정보
정기간행물|ENG|
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이 논문은 한국과학기술정보연구원과 논문 연계를 통해 무료로 제공되는 원문입니다.
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기타언어초록

The effects of $N^+$ ion implantation on surface structures andproperties of polyimide films were investigated. The polyimide films were modified by 100keV ionsusinga $N^+$ source at flow rates ranging from $5{ imes}10^{14}$ to $5{ imes}10^{17}$ ions/$cm^2$ with an ion current density of 10 ${mu}A/cm^{2}$. After the ion treatment, the chemical structures and morphology of the surfaces were examined in detail by X-ray photoelectron spectroscopy and scanning probemicroscopy, respectively. The implantation of $N^+$ ions not only destroyed the chemical bonds as a result of random collisions by the incident ions and the energy transfer to the polymeratoms but also roughened the surface of the polyimide film. The roughness of thepolyimide surface increased with increasing ion fluence, and the contact angle of the polyimide surface with water decreased.